Chin. J. Semicond. > 1994, Volume 15 > Issue 3 > 217-222

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Determination　of　Interstitial　Oxygen　Concentration　in　Heavily　Doped　Silicon　by　Combination　of　Neutron　Irradiation　and　FTIR

Ma Zhenyu , Wang Qiyuan , Zan Yude , Cai Tianhai , Yu Yuanhuan and Lin Lanying

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    Received: 18 August 2015 Revised: Online: Published: 01 March 1994

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      Article Navigation >  Journal of Semiconductors  > 1994  >  15(3): 217-222
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      • Received Date: 2015-08-18

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