Chin. J. Semicond. > 2005, Volume 26 > Issue 5 > 1065-1071

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Key words: 厚层抗蚀剂光刻曝光增强Dill模型曝光参数

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    Received: 19 August 2015 Revised: Online: Published: 01 May 2005

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      • Received Date: 2015-08-19

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