SEMICONDUCTOR INTEGRATED CIRCUITS

Effect of electric field on metallic SWCNT interconnects for nanoscale technologies

Harsimran Kaur and Karamjit Singh Sandha

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 Corresponding author: Harsimran Kaur, E-mail: harsimrankaurvlsithapar@gmail.com

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Abstract: The influence of an electric field on metallic single walled carbon nanotube (SWCNT) interconnects is studied. A voltage-dependent equivalent circuit model is presented for the impedance parameters of single-wall carbon nanotubes that capture various electron—phonon scattering mechanisms as a function of the electric field. To estimate the performance of SWCNT bundle interconnects, signal delay and power dissipation are calculated based on the field dependent model that results in an improvement in the delay and power estimation accuracy compared to the field-independent model. We find that the power delay product of a SWCNT bundle increases with the increase in electric field but decreases with technology scaling showing that at a low electric field, the SWCNT bundle is a potential reliable alternative interconnect for future high performance VLSI industry at scaled technologies.

Key words: carbon nanotubesingle wall carbon nanotubemetallic single wall carbon nanotubemultiwall carbon nanotubevery large scale integration



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Fig. 1.  Cross-sectional view of a CNT bundle with width $W $and height $H$. The diameter of each CNT is $D$, and the interval between neighboring CNTs is $d$ (for densely packed, $d$ $=$ 0.34 nm, which is the Van der Waal's gap). $n_{\rm W}$ and $n_{\rm H}$ are the numbers of CNTs along the width and height, respectively[6].

Fig. 2.  Equivalent electrical circuit model of a metallic SWCNT[9].

Fig. 3.  Idealized diagrams illustrating electron-phonon scattering in metallic SWCNTs. (a) Acoustic phonon scattering. Optical phonon absorption and emission scattering processes are shown in (b) and (c) respectively. (d) Zone-boundary phonon scattering [14].

Fig. 4.  Variation of mean free paths of SWCNT interconnects for length 1000 $\mu $m and diameter 2 nm as a function of electric field.

Fig. 5.  Variation of mean free paths of SWCNT interconnects for length 1000 $\mu $m and electric field 0.02 V/$\mu $m as a function of diameter.

Fig. 6.  Variation of resistance of SWCNT bundle interconnects for length 1000 $\mu $m and diameter 2 nm as a function of electric field.

Fig. 7.  Variation of resistance of SWCNT bundle interconnects for length 1000 $\mu $m and electric field of 0.02 V/$\mu $m as a function of diameter.

Fig. 8.  Optimum number of repeaters inserted to drive SWCNT bundle interconnects[29].

Fig. 9.  Variation of signal delay with the number of repeaters at different technologies for length 1000 $\mu $m, diameter 2 nm and electric field 0.02 V/$\mu $m.

Fig. 10.  Variation of signal delay with electric field at different technologies for length 1000 $\mu $m and diameter 2 nm.

Fig. 11.  Variation of power delay product with electric field at different technologies for length 1000 $\mu $m and diameter 2 nm.

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Table 1.   Technology parameters for length $=$ 1000 $\mu $m and diameter varying from 1 to 2 nm[27].

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Table 2.   Variation of power (in $\mu $W) with the number of repeaters at different technologies for length 1000 $\mu $m, diameter 2 nm and electric field 0.02 V/$\mu $m.

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Table 3.   Variation of power (in $\mu $W) with electric field at different technologies for length 1000 $\mu $m and diameter 2 nm.

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    Received: 24 April 2014 Revised: Online: Published: 01 March 2015

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      Harsimran Kaur, Karamjit Singh Sandha. Effect of electric field on metallic SWCNT interconnects for nanoscale technologies[J]. Journal of Semiconductors, 2015, 36(3): 035001. doi: 10.1088/1674-4926/36/3/035001 H Kaur, K S Sandha. Effect of electric field on metallic SWCNT interconnects for nanoscale technologies[J]. J. Semicond., 2015, 36(3): 035001. doi:  10.1088/1674-4926/36/3/035001.Export: BibTex EndNote
      Citation:
      Harsimran Kaur, Karamjit Singh Sandha. Effect of electric field on metallic SWCNT interconnects for nanoscale technologies[J]. Journal of Semiconductors, 2015, 36(3): 035001. doi: 10.1088/1674-4926/36/3/035001

      H Kaur, K S Sandha. Effect of electric field on metallic SWCNT interconnects for nanoscale technologies[J]. J. Semicond., 2015, 36(3): 035001. doi:  10.1088/1674-4926/36/3/035001.
      Export: BibTex EndNote

      Effect of electric field on metallic SWCNT interconnects for nanoscale technologies

      doi: 10.1088/1674-4926/36/3/035001
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      • Corresponding author: E-mail: harsimrankaurvlsithapar@gmail.com
      • Received Date: 2014-04-24
      • Accepted Date: 2014-10-08
      • Published Date: 2015-01-25

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