Fig. 1.
SEM images of PS spheres monolayer on the p-silicon wafer fabricated at different first step spin rates from 100-500 rpm.
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| Citation: |
S. S. Shinde, S. Park. Oriented colloidal-crystal thin films of polystyrene spheres via spin coating[J]. Journal of Semiconductors, 2015, 36(2): 023001. doi: 10.1088/1674-4926/36/2/023001
S. S. Shinde, S. Park. Oriented colloidal-crystal thin films of polystyrene spheres via spin coating[J]. J. Semicond., 2015, 36(2): 023001. doi: 10.1088/1674-4926/36/2/023001.
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Oriented colloidal-crystal thin films of polystyrene spheres via spin coating
doi: 10.1088/1674-4926/36/2/023001
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Abstract
We developed a simple and inexpensive synthesis of a large-scale close-packed monolayer of polystyrene sphere arrays, which have a variety of applications. The influence of three step spin speeds, spinning time, solution quantity and relative humidity is studied in order to achieve a large area close-packed monolayer. A relatively high surface coverage and uniform monolayer of PS spheres in the range of 85%—90% are achieved by appropriate control of the preparative parameters. Also the effect of the oxygen plasma etching process on the reduction of PS spheres has been studied. We conclude that it can be useful in industrial applications, because of the fabrication speed, surface coverage, control over PS spheres and cost of the process.-
Keywords:
- monolayer,
- PS spheres,
- oxygen plasma
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References
[1] [2] [3] [4] [5] [6] [7] [8] [9] [10] [11] [12] [13] [14] [15] [16] -
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