Fig. 1.
(a) Schematic illustration of ESC model. (b) Electrode pattern of two D-shape types
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Xingkuo Wang, Jia Cheng, Kesheng Wang, Yiyong Yang, Yuchun Sun, Minglu Cao, Linhong Ji. Finite element analysis on factors influencing the clamping force in an electrostatic chuck[J]. Journal of Semiconductors, 2014, 35(9): 094011. doi: 10.1088/1674-4926/35/9/094011
X K Wang, J Cheng, K S Wang, Y Y Yang, Y C Sun, M L Cao, L H Ji. Finite element analysis on factors influencing the clamping force in an electrostatic chuck[J]. J. Semicond., 2014, 35(9): 094011. doi: 10.1088/1674-4926/35/9/094011.
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Finite element analysis on factors influencing the clamping force in an electrostatic chuck
doi: 10.1088/1674-4926/35/9/094011
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Abstract
As one of the core components of IC manufacturing equipment, the electrostatic chuck (ESC) has been widely applied in semiconductor processing such as etching, PVD and CVD. The clamping force of the ESC is one of the most important technical indicators. A multi-physics simulation software COMSOL is used to analyze the factors influencing the clamping force. The curves between the clamping force and the main parameters such as DC voltage, electrode thickness, electrode radius, dielectric thickness and helium gap are obtained. Moreover, the effects of these factors on the clamping force are investigated by means of orthogonal experiments. The results show that the factors can be ranked in order of voltage, electrode radius, helium gap and dielectric thickness according to their importance, which may offer certain reference for the design of ESCs. -
References
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