Chin. J. Semicond. > 2005, Volume 26 > Issue 3 > 513-516

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Abstract: 用水平推舟液相外延的方法,以CdZnTe作衬底,固态HgTe作为Hg补偿源,从富Te-HgCdTe溶液中外延生长大面积HgCdTe薄膜。通过选择合适的温度控制和生长速率,获得组分均匀性和重复性较好的大面积长波HgCdTe薄膜。

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2005

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      液相外延HgCdTe薄膜组分均匀性的研究[J]. Journal of Semiconductors, 2005, In Press. 液相外延HgCdTe薄膜组分均匀性的研究[J]. Chin. J. Semicond., 2005, 26(3): 513.Export: BibTex EndNote
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      液相外延HgCdTe薄膜组分均匀性的研究[J]. Journal of Semiconductors, 2005, In Press.

      液相外延HgCdTe薄膜组分均匀性的研究[J]. Chin. J. Semicond., 2005, 26(3): 513.
      Export: BibTex EndNote

      液相外延HgCdTe薄膜组分均匀性的研究

      • Received Date: 2015-08-19

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