Chin. J. Semicond. > 2007, Volume 28 > Issue 2 > 145-148

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DCXRD Investigation of a Ge/Si(001) Island Multilayer Structure

Shi Wenhua, Xue Chunlai, Luo Liping and Wang Qiming

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Abstract: A Ge/Si(001) island multilayer structure is investigated by double crystal X-ray diffraction,transmission electron microscopy,and atomic force microscopy.We fit the satellite peaks in the rocking curve by two Lorentz lineshapes,which originate from the wetting layer region and the island region.Then from the ratio of the thicknesses of the Si and Ge (GeSi) layers as determined by TEM,the Ge compositions of the wetting layer and islands are estimated to be about 0.51 and 0.67,respectively,according to the positions of the fitted peaks.This proves to be a relatively simple way to investigate the Ge/Si (001) island multilayer structure.

Key words: SiGenano-dotislandX-ray

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    Received: 18 August 2015 Revised: 25 September 2006 Online: Published: 01 February 2007

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      Shi Wenhua, Xue Chunlai, Luo Liping, Wang Qiming. DCXRD Investigation of a Ge/Si(001) Island Multilayer Structure[J]. Journal of Semiconductors, 2007, In Press. Shi W H, Xue C L, Luo L P, Wang Q M. DCXRD Investigation of a Ge/Si(001) Island Multilayer Structure[J]. Chin. J. Semicond., 2007, 28(2): 145.Export: BibTex EndNote
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      Shi Wenhua, Xue Chunlai, Luo Liping, Wang Qiming. DCXRD Investigation of a Ge/Si(001) Island Multilayer Structure[J]. Journal of Semiconductors, 2007, In Press.

      Shi W H, Xue C L, Luo L P, Wang Q M. DCXRD Investigation of a Ge/Si(001) Island Multilayer Structure[J]. Chin. J. Semicond., 2007, 28(2): 145.
      Export: BibTex EndNote

      DCXRD Investigation of a Ge/Si(001) Island Multilayer Structure

      • Received Date: 2015-08-18
      • Accepted Date: 2006-07-20
      • Revised Date: 2006-09-25
      • Published Date: 2007-01-30

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