Chin. J. Semicond. > 2007, Volume 28 > Issue 12 > 1860-1863

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In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz

Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Yang Hao, Xu Jingbo, Song Yuzhu, Zhang Jian, Niu Jiebin and Liu Xunchun

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Abstract: By epitaxial layer structure design and key fabrication process optimization,a lattice-matched InP-based In0.53Ga0.47As-In0.52Al0.48As HEMT with an ultra high maximum oscillation frequency (fmax) of 183GHz was fabricated.Thefmax is the highest value for HEMTs in China.Also,the devices are reported,including the device structure,the fabrication process,and the DC and RF performances.

Key words: maximum oscillation frequency/power-gain cutoff frequencyhigh electron mobility transistorInGaAs/InAlAs InP

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    Received: 18 August 2015 Revised: 12 June 2007 Online: Published: 01 December 2007

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      Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Yang Hao, Xu Jingbo, Song Yuzhu, Zhang Jian, Niu Jiebin, Liu Xunchun. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Journal of Semiconductors, 2007, In Press. Liu L, Zhang H Y, Yin J J, Li X, Yang H, Xu J B, Song Y Z, Zhang J, Niu J B, Liu X C. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Chin. J. Semicond., 2007, 28(12): 1860.Export: BibTex EndNote
      Citation:
      Liu Liang, Zhang Haiying, Yin Junjian, Li Xiao, Yang Hao, Xu Jingbo, Song Yuzhu, Zhang Jian, Niu Jiebin, Liu Xunchun. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Journal of Semiconductors, 2007, In Press.

      Liu L, Zhang H Y, Yin J J, Li X, Yang H, Xu J B, Song Y Z, Zhang J, Niu J B, Liu X C. In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz[J]. Chin. J. Semicond., 2007, 28(12): 1860.
      Export: BibTex EndNote

      In0.53Ga0.47As/In0.52Al0.48As HEMTs with fmax of 183GHz

      • Received Date: 2015-08-18
      • Accepted Date: 2007-06-12
      • Revised Date: 2007-06-12
      • Published Date: 2007-11-28

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