Chin. J. Semicond. > 2002, Volume 23 > Issue 3 > 319-322
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集成电路工艺模拟中的离子注入设备模型研究

李煜 , 李瑞伟 and 王纪民

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Key words: 设备模型, 工艺模拟, 离子注入, 沟道效应

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(3): 319-322
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      • Received Date: 2015-08-19

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