J. Semicond. > 2008, Volume 29 > Issue 11 > 2180-2186

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Effect of Width Ratio on the Etching Behavior of Joint Channel Structure

Wu Changju, Jin Zhonghe and Wang Yuelin

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Abstract: Effect of width ratio on the etching behaviour of joint channel structure is studied.By theory and experiments,the etching behaviors of joint channel with different width ratios are compared.The results show that the effect of width ratio on the etching behavior is much different for the narrow-wide joint channel and the wide-narrow structure.For the narrow-wide joint channel,the etching process depends not only on the width ratio but also on the width of the channel.The etching rate and concentration of etching front at each stage are very close with the same width ratio.The etching time required at each stage increases with the channel width,but the final total etching time is very close if the length of the wide channel is much longer.For the wide-narrow joint channel,the etching process depends only on the width ratio.For wide-narrow joint channel,the etching process,including the required etching time,is absolutely the same with the same width ratio.The etching rate and concentration of etching front at each stage increases with the rise of the width ratio,while the total etching time decreases with the increase of width ratio.

Key words: joint channelwidth ratioetching rate

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    Received: 18 August 2015 Revised: 22 July 2008 Online: Published: 01 November 2008

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      Wu Changju, Jin Zhonghe, Wang Yuelin. Effect of Width Ratio on the Etching Behavior of Joint Channel Structure[J]. Journal of Semiconductors, 2008, In Press. Wu C J, Jin Z H, Wang Y L. Effect of Width Ratio on the Etching Behavior of Joint Channel Structure[J]. J. Semicond., 2008, 29(11): 2180.Export: BibTex EndNote
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      Wu Changju, Jin Zhonghe, Wang Yuelin. Effect of Width Ratio on the Etching Behavior of Joint Channel Structure[J]. Journal of Semiconductors, 2008, In Press.

      Wu C J, Jin Z H, Wang Y L. Effect of Width Ratio on the Etching Behavior of Joint Channel Structure[J]. J. Semicond., 2008, 29(11): 2180.
      Export: BibTex EndNote

      Effect of Width Ratio on the Etching Behavior of Joint Channel Structure

      • Received Date: 2015-08-18
      • Accepted Date: 2008-04-28
      • Revised Date: 2008-07-22
      • Published Date: 2008-11-11

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