Chin. J. Semicond. > 1989, Volume 10 > Issue 8 > 615-619

CONTENTS

退火气氛中痕量氧在反应形成Pt硅化物中的作用

李映雪 , 武国英 , 张国炳 and 王佑祥

PDF

  • Search

    Advanced Search >>

    Article Metrics

    Article views: 2474 Times PDF downloads: 1093 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 August 1989

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Export: BibTex EndNote
      Citation:


      Export: BibTex EndNote

      • Received Date: 2015-08-19

      Catalog

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return