Chin. J. Semicond. > 1999, Volume 20 > Issue 9 > 837-840

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ECR Plasma CVD法淀积介质膜技术在半导体光电器件中的应用

茅冬生 and 谭满清

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    Received: 19 August 2015 Revised: Online: Published: 01 September 1999

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      • Received Date: 2015-08-19

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