Chin. J. Semicond. > 2005, Volume 26 > Issue 1 > 52-56

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Abstract: 用旋涂法实现了多孔硅与聚乙烯咔唑的复合,并研究了不同温度热处理后复合体系的电学和光学性能.实验结果表明:热处理有利于复合体系发光强度的提高;而且当热处理温度不超过120℃,随着热处理温度的升高器件的整流效应增大.同时,复合体系还实现了电致发光,产生了555nm的电致发光峰.

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    Received: 19 August 2015 Revised: Online: Published: 01 January 2005

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      多孔硅/PVK复合体系的光电性能[J]. Journal of Semiconductors, 2005, In Press. 多孔硅/PVK复合体系的光电性能[J]. Chin. J. Semicond., 2005, 26(1): 52.Export: BibTex EndNote
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      多孔硅/PVK复合体系的光电性能[J]. Journal of Semiconductors, 2005, In Press.

      多孔硅/PVK复合体系的光电性能[J]. Chin. J. Semicond., 2005, 26(1): 52.
      Export: BibTex EndNote

      多孔硅/PVK复合体系的光电性能

      • Received Date: 2015-08-19

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