Chin. J. Semicond. > 1986, Volume 7 > Issue 2 > 209-213
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硼、砷双注入载流子浓度分布的测量及计算机模拟

马谊 , 李国辉 , 张通和 and 黄敞

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1986

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      Article Navigation >  Journal of Semiconductors  > 1986  >  7(2): 209-213
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      • Received Date: 2015-08-20

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