Abstract: two classes of nanoscale fabrication techniques, including high-resolution techniques and process induced techniques, are introduced. High-resolution techniques, as the extension of microelectronics lithography, include the efficient but expensive Extreme Ultraviolet lithography, the very efficient and low-cost, immature nano-imprint lithography, and the fine but low-output Scanning Probe lithography. Process induced techniques use some routinely used process and principle, such as sidewall, anisotropic etching and porous anodic aluminum oxide template to form local or self-assemble well-controlled nanostructure. Although the nanostructure is beyond the resolution of photolithography used in process, the integrated density is restricted by photolithography.

Key words: nanofabrication photolithography imprint lithography sidewall patterning anisotropic etching porous anodic aluminum oxide template quantum confinement effect S-K mode,  光刻,  纳米压印,  扫描探针显微镜,  侧墙掩模,  各向异性腐蚀,  多孔氧化铝模板,  量子限制 效应,  S-K 模式