Chin. J. Semicond. > 2004, Volume 25 > Issue 1 > 26-29
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利用背面曝光技术制造大高宽比SU8结构的一种新方法(英文)

伊福廷 , 缪鹏 , 彭良强 , 张菊芳 and 韩勇

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Key words: MEMS, SU8胶, 微加工, 背面曝光

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    Received: 19 August 2015 Revised: Online: Published: 01 January 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(1): 26-29
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      • Received Date: 2015-08-19

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