Chin. J. Semicond. > 1999, Volume 20 > Issue 11 > 1044-1048

CONTENTS

铁电PbZr_(0.53)Ti_(0.47)O_3薄膜的磁增强反应离子刻蚀

刘秦 , 林殷茵 , 吴小清 , 张良莹 and 姚熹

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    Article Metrics

    Article views: 2513 Times PDF downloads: 1076 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 November 1999

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1999  >  20(11): 1044-1048
      Export: BibTex EndNote
      Citation:


      Export: BibTex EndNote
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return