ARTICLES

First-principles study of the growth and diffusion of B and N atoms on the sapphire surface with h-BN as the buffer layer

Jianyun Zhao1, Xu Li1, Ting Liu1, Yong Lu1, and Jicai Zhang1, 2,

+ Author Affiliations

 Corresponding author: Yong Lu, luy@mail.buct.edu.cn; Jicai Zhang, jczhang@mail.buct.edu.cn

PDF

Turn off MathJax

Abstract: Currently, the preparation of large-size and high-quality hexagonal boron nitride is still an urgent problem. In this study, we investigated the growth and diffusion of boron and nitrogen atoms on the sapphire/h-BN buffer layer by first-principles calculations based on density functional theory. The surface of the single buffer layer provides several metastable adsorption sites for free B and N atoms due to exothermic reaction. The adsorption sites at the ideal growth point for B atoms have the lowest adsorption energy, but the N atoms are easily trapped by the N atoms on the surface to form N–N bonds. With the increasing buffer layers, the adsorption process of free atoms on the surface changes from exothermic to endothermic. The diffusion rate of B atoms is much higher than that of the N atoms thus the B atoms play a major role in the formation of B–N bonds. The introduction of buffer layers can effectively shield the negative effect of sapphire on the formation of B–N bonds. This makes the crystal growth on the buffer layer tends to two-dimensional growth, beneficial to the uniform distribution of B and N atoms. These findings provide an effective reference for the h-BN growth.

Key words: hexagonal boron nitridebuffer layerfirst-principles calculationsmolecular dynamics



[1]
Geim A K, Novoselov K S. The rise of graphene. Nat Mater, 2007, 6, 183 doi: 10.1038/nmat1849
[2]
Wang J G, Mu X J, Wang X X, et al. The thermal and thermoelectric properties of in-plane C-BN hybrid structures and graphene/h-BN van der Waals heterostructures. Mater Today Phys, 2018, 5, 29 doi: 10.1016/j.mtphys.2018.05.006
[3]
Tang Q, Zhou Z. Graphene-analogous low-dimensional materials. Prog Mater Sci, 2013, 58, 1244 doi: 10.1016/j.pmatsci.2013.04.003
[4]
Wang J G, Ma F C, Sun M T. Graphene, hexagonal boron nitride, and their heterostructures: Properties and applications. RSC Adv, 2017, 7, 16801 doi: 10.1039/C7RA00260B
[5]
Song Y X, Zhang C R, Li B, et al. Triggering the atomic layers control of hexagonal boron nitride films. Appl Surf Sci, 2014, 313, 647 doi: 10.1016/j.apsusc.2014.06.040
[6]
Dahal R, Li J, Majety S, et al. Epitaxially grown semiconducting hexagonal boron nitride as a deep ultraviolet photonic material. Appl Phys Lett, 2011, 98, 211110 doi: 10.1063/1.3593958
[7]
Doan T C, Majety S, Grenadier S, et al. Fabrication and characterization of solid-state thermal neutron detectors based on hexagonal boron nitride epilayers. Nucl Instrum Methods Phys Res Sect A, 2014, 748, 84 doi: 10.1016/j.nima.2014.02.031
[8]
Jiang H X, Lin J Y. Hexagonal boron nitride for deep ultraviolet photonic devices. Semicond Sci Technol, 2014, 29, 084003 doi: 10.1088/0268-1242/29/8/084003
[9]
Cai L C, Fan X H, Su H T, et al. First principles calculation of the lattice constants of hexagonal and cubic boron nitride to 3000 K and 30 GPa. Ferroelectrics, 2020, 566, 136 doi: 10.1080/00150193.2020.1762437
[10]
Hafner J. Ab-initio simulations of materials using VASP: Density-functional theory and beyond. J Comput Chem, 2008, 29, 2044 doi: 10.1002/jcc.21057
[11]
Chadi D J. Special points for Brillouin-zone integrations. Phys Rev B, 1977, 16, 1746 doi: 10.1103/PhysRevB.16.1746
[12]
Yang X, Nitta S, Nagamatsu K, et al. Growth of hexagonal boron nitride on sapphire substrate by pulsed-mode metalorganic vapor phase epitaxy. J Cryst Growth, 2018, 482, 1 doi: 10.1016/j.jcrysgro.2017.10.036
[13]
Chikh H, SI Ahmed F, Afir A, et al. In-situ X-ray diffraction study of alumina α-Al2O3 thermal behavior under dynamic vacuum and constant flow of nitrogen. J Alloy Compd, 2016, 654, 509 doi: 10.1016/j.jallcom.2015.09.131
[14]
Wu J H, Hagelberg F, Sattler K. First-principles calculations of small silicon clusters adsorbed on a graphite surface. Phys Rev B, 2005, 72, 085441 doi: 10.1103/PhysRevB.72.085441
[15]
Govind Rajan A, Strano M S, Blankschtein D. Ab initio molecular dynamics and lattice dynamics-based force field for modeling hexagonal boron nitride in mechanical and interfacial applications. J Phys Chem Lett, 2018, 9, 1584 doi: 10.1021/acs.jpclett.7b03443
[16]
Zoroddu A, Bernardini F, Ruggerone P, et al. First-principles prediction of structure, energetics, formation enthalpy, elastic constants, polarization, and piezoelectric constants of AlN, GaN, and InN: Comparison of local and gradient-corrected density-functional theory. Phys Rev B, 2001, 64, 045208 doi: 10.1103/PhysRevB.64.045208
[17]
Shigemi A, Wada T. Enthalpy of formation of various phases and formation energy of point defects in perovskite-type NaNbO3 by first-principles calculation. Jpn J Appl Phys, 2004, 43, 6793 doi: 10.1143/JJAP.43.6793
[18]
Petrushenko I K, Petrushenko K B. Stone-Wales defects in graphene-like boron nitride-carbon heterostructures: Formation energies, structural properties, and reactivity. Comput Mater Sci, 2017, 128, 243 doi: 10.1016/j.commatsci.2016.11.039
[19]
Nosé S. A unified formulation of the constant temperature molecular dynamics methods. J Chem Phys, 1984, 81, 511 doi: 10.1063/1.447334
[20]
Wang V, Xu N, Liu J C, et al. VASPKIT: A user-friendly interface facilitating high-throughput computing and analysis using VASP code. arXiv: 1908.08269, 2019
[21]
Kowsari M H, Alavi S, Ashrafizaadeh M, et al. Molecular dynamics simulation of imidazolium-based ionic liquids. I. Dynamics and diffusion coefficient. J Chem Phys, 2008, 129, 224508 doi: 10.1063/1.3035978
[22]
Sadki K, Zanane F Z, Ouahman M, et al. Molecular dynamics study of pristine and defective hexagonal BN, SiC and SiGe monolayers. Mater Chem Phys, 2020, 242, 122474 doi: 10.1016/j.matchemphys.2019.122474
[23]
Nagai T, Tsurumaki S, Urano R, et al. Position-dependent diffusion constant of molecules in heterogeneous systems as evaluated by the local mean squared displacement. J Chem Theory Comput, 2020, 16, 7239 doi: 10.1021/acs.jctc.0c00448
[24]
Manga V R, Poirier D R. Ab initio molecular dynamics simulation of self-diffusion in Al–Si binary melts. Model Simul Mater Sci Eng, 2018, 26, 065006 doi: 10.1088/1361-651X/aacdbc
[25]
Chubarov M, Högberg H, Henry A, et al. Challenge in determining the crystal structure of epitaxial 0001 oriented sp 2 -BN films. J Vac Sci Technol A, 2018, 36, 030801 doi: 10.1116/1.5024314
[26]
Skuridina D, Dinh D V, Pristovsek M, et al. Surface and crystal structure of nitridated sapphire substrates and their effect on polar InN layers. Appl Surf Sci, 2014, 307, 461 doi: 10.1016/j.apsusc.2014.04.057
[27]
Dwikusuma F, Kuech T F. X-ray photoelectron spectroscopic study on sapphire nitridation for GaN growth by hydride vapor phase epitaxy: Nitridation mechanism. J Appl Phys, 2003, 94, 5656 doi: 10.1063/1.1618357
Fig. 1.  (Color online) The top view of free B atoms at different adsorption sites with one h-BN buffer layer. (a–e) show the initial adsorption sites and (f–j) show the final configurations after optimization.

Fig. 2.  (Color online) The top view of free N atoms at different adsorption sites with one h-BN buffer layer. (a–e) show the initial adsorption sites and (f–j) show the final configurations after optimization.

Fig. 3.  (Color online) (a–c) The top view and (d–f) front view of the optimized adsorption positions for B atom on the surface with different buffer layers. The SC site is chosen as the initial absorption site for the B atom.

Fig. 4.  (Color online) (a–c) The top view and (d–f) front view of the optimized adsorption positions for the N atom on the surface with different buffer layers. The SC site is chosen as the initial absorption site for the B atom.

Fig. 5.  (Color online) The probability distribution functions of atomic displacements projected onto the xy plane for (a) the B atom at 300 K, (b) the N atom at 300 K, (c) the B atom at 1573 K and (d) the N atom at 1573 K, respectively. The color scale indicates the distribution probability. The positions of B and N atoms of the buffer layer are marked.

Fig. 6.  The MSD curves of (a) B atoms and (b) N atoms on the buffer layer surface at different temperatures.

Table 1.   The formation energies (eV) of free B or N atoms at the surface sites of the Al2O3/h-BN-buffer-layer model.

Free atomS1 (SC)S2S3S4 (SB-top)S5 (SN-top)
B–0.87–1.11–1.11–0.76–1.11
N–2.05–2.05–2.05–0.77–2.02
DownLoad: CSV

Table 2.   The formation energies of free B and N atoms at the same position on the surface of the Al2O3/h-BN-buffer-layer model in a different number of buffer layers.

Parameter1 buffer layer2 buffer layers3 buffer layers
B atom (eV)–0.87–0.140.01
N atom (eV)–2.050.060.12
DownLoad: CSV

Table 3.   Diffusion coefficients of free atoms on the surface of the model at different temperatures.

Free atomT (K)D (10–9 m2/s)
B3001.07
157317.04
N3000.35
15737.18
DownLoad: CSV
[1]
Geim A K, Novoselov K S. The rise of graphene. Nat Mater, 2007, 6, 183 doi: 10.1038/nmat1849
[2]
Wang J G, Mu X J, Wang X X, et al. The thermal and thermoelectric properties of in-plane C-BN hybrid structures and graphene/h-BN van der Waals heterostructures. Mater Today Phys, 2018, 5, 29 doi: 10.1016/j.mtphys.2018.05.006
[3]
Tang Q, Zhou Z. Graphene-analogous low-dimensional materials. Prog Mater Sci, 2013, 58, 1244 doi: 10.1016/j.pmatsci.2013.04.003
[4]
Wang J G, Ma F C, Sun M T. Graphene, hexagonal boron nitride, and their heterostructures: Properties and applications. RSC Adv, 2017, 7, 16801 doi: 10.1039/C7RA00260B
[5]
Song Y X, Zhang C R, Li B, et al. Triggering the atomic layers control of hexagonal boron nitride films. Appl Surf Sci, 2014, 313, 647 doi: 10.1016/j.apsusc.2014.06.040
[6]
Dahal R, Li J, Majety S, et al. Epitaxially grown semiconducting hexagonal boron nitride as a deep ultraviolet photonic material. Appl Phys Lett, 2011, 98, 211110 doi: 10.1063/1.3593958
[7]
Doan T C, Majety S, Grenadier S, et al. Fabrication and characterization of solid-state thermal neutron detectors based on hexagonal boron nitride epilayers. Nucl Instrum Methods Phys Res Sect A, 2014, 748, 84 doi: 10.1016/j.nima.2014.02.031
[8]
Jiang H X, Lin J Y. Hexagonal boron nitride for deep ultraviolet photonic devices. Semicond Sci Technol, 2014, 29, 084003 doi: 10.1088/0268-1242/29/8/084003
[9]
Cai L C, Fan X H, Su H T, et al. First principles calculation of the lattice constants of hexagonal and cubic boron nitride to 3000 K and 30 GPa. Ferroelectrics, 2020, 566, 136 doi: 10.1080/00150193.2020.1762437
[10]
Hafner J. Ab-initio simulations of materials using VASP: Density-functional theory and beyond. J Comput Chem, 2008, 29, 2044 doi: 10.1002/jcc.21057
[11]
Chadi D J. Special points for Brillouin-zone integrations. Phys Rev B, 1977, 16, 1746 doi: 10.1103/PhysRevB.16.1746
[12]
Yang X, Nitta S, Nagamatsu K, et al. Growth of hexagonal boron nitride on sapphire substrate by pulsed-mode metalorganic vapor phase epitaxy. J Cryst Growth, 2018, 482, 1 doi: 10.1016/j.jcrysgro.2017.10.036
[13]
Chikh H, SI Ahmed F, Afir A, et al. In-situ X-ray diffraction study of alumina α-Al2O3 thermal behavior under dynamic vacuum and constant flow of nitrogen. J Alloy Compd, 2016, 654, 509 doi: 10.1016/j.jallcom.2015.09.131
[14]
Wu J H, Hagelberg F, Sattler K. First-principles calculations of small silicon clusters adsorbed on a graphite surface. Phys Rev B, 2005, 72, 085441 doi: 10.1103/PhysRevB.72.085441
[15]
Govind Rajan A, Strano M S, Blankschtein D. Ab initio molecular dynamics and lattice dynamics-based force field for modeling hexagonal boron nitride in mechanical and interfacial applications. J Phys Chem Lett, 2018, 9, 1584 doi: 10.1021/acs.jpclett.7b03443
[16]
Zoroddu A, Bernardini F, Ruggerone P, et al. First-principles prediction of structure, energetics, formation enthalpy, elastic constants, polarization, and piezoelectric constants of AlN, GaN, and InN: Comparison of local and gradient-corrected density-functional theory. Phys Rev B, 2001, 64, 045208 doi: 10.1103/PhysRevB.64.045208
[17]
Shigemi A, Wada T. Enthalpy of formation of various phases and formation energy of point defects in perovskite-type NaNbO3 by first-principles calculation. Jpn J Appl Phys, 2004, 43, 6793 doi: 10.1143/JJAP.43.6793
[18]
Petrushenko I K, Petrushenko K B. Stone-Wales defects in graphene-like boron nitride-carbon heterostructures: Formation energies, structural properties, and reactivity. Comput Mater Sci, 2017, 128, 243 doi: 10.1016/j.commatsci.2016.11.039
[19]
Nosé S. A unified formulation of the constant temperature molecular dynamics methods. J Chem Phys, 1984, 81, 511 doi: 10.1063/1.447334
[20]
Wang V, Xu N, Liu J C, et al. VASPKIT: A user-friendly interface facilitating high-throughput computing and analysis using VASP code. arXiv: 1908.08269, 2019
[21]
Kowsari M H, Alavi S, Ashrafizaadeh M, et al. Molecular dynamics simulation of imidazolium-based ionic liquids. I. Dynamics and diffusion coefficient. J Chem Phys, 2008, 129, 224508 doi: 10.1063/1.3035978
[22]
Sadki K, Zanane F Z, Ouahman M, et al. Molecular dynamics study of pristine and defective hexagonal BN, SiC and SiGe monolayers. Mater Chem Phys, 2020, 242, 122474 doi: 10.1016/j.matchemphys.2019.122474
[23]
Nagai T, Tsurumaki S, Urano R, et al. Position-dependent diffusion constant of molecules in heterogeneous systems as evaluated by the local mean squared displacement. J Chem Theory Comput, 2020, 16, 7239 doi: 10.1021/acs.jctc.0c00448
[24]
Manga V R, Poirier D R. Ab initio molecular dynamics simulation of self-diffusion in Al–Si binary melts. Model Simul Mater Sci Eng, 2018, 26, 065006 doi: 10.1088/1361-651X/aacdbc
[25]
Chubarov M, Högberg H, Henry A, et al. Challenge in determining the crystal structure of epitaxial 0001 oriented sp 2 -BN films. J Vac Sci Technol A, 2018, 36, 030801 doi: 10.1116/1.5024314
[26]
Skuridina D, Dinh D V, Pristovsek M, et al. Surface and crystal structure of nitridated sapphire substrates and their effect on polar InN layers. Appl Surf Sci, 2014, 307, 461 doi: 10.1016/j.apsusc.2014.04.057
[27]
Dwikusuma F, Kuech T F. X-ray photoelectron spectroscopic study on sapphire nitridation for GaN growth by hydride vapor phase epitaxy: Nitridation mechanism. J Appl Phys, 2003, 94, 5656 doi: 10.1063/1.1618357
  • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2092 Times PDF downloads: 49 Times Cited by: 0 Times

    History

    Received: 20 March 2021 Revised: 27 March 2021 Online: Accepted Manuscript: 29 April 2021Uncorrected proof: 30 April 2021Published: 01 August 2021

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Jianyun Zhao, Xu Li, Ting Liu, Yong Lu, Jicai Zhang. First-principles study of the growth and diffusion of B and N atoms on the sapphire surface with h-BN as the buffer layer[J]. Journal of Semiconductors, 2021, 42(8): 082801. doi: 10.1088/1674-4926/42/8/082801 J Y Zhao, X Li, T Liu, Y Lu, J C Zhang, First-principles study of the growth and diffusion of B and N atoms on the sapphire surface with h-BN as the buffer layer[J]. J. Semicond., 2021, 42(8): 082801. doi: 10.1088/1674-4926/42/8/082801.Export: BibTex EndNote
      Citation:
      Jianyun Zhao, Xu Li, Ting Liu, Yong Lu, Jicai Zhang. First-principles study of the growth and diffusion of B and N atoms on the sapphire surface with h-BN as the buffer layer[J]. Journal of Semiconductors, 2021, 42(8): 082801. doi: 10.1088/1674-4926/42/8/082801

      J Y Zhao, X Li, T Liu, Y Lu, J C Zhang, First-principles study of the growth and diffusion of B and N atoms on the sapphire surface with h-BN as the buffer layer[J]. J. Semicond., 2021, 42(8): 082801. doi: 10.1088/1674-4926/42/8/082801.
      Export: BibTex EndNote

      First-principles study of the growth and diffusion of B and N atoms on the sapphire surface with h-BN as the buffer layer

      doi: 10.1088/1674-4926/42/8/082801
      More Information
      • Author Bio:

        Jianyun Zhao got his B.E. degree from Beijing University of Chemical Technology in 2018. Now he is a postgraduate student at Beijing University of Chemical Technology under the supervision of Prof. Jicai Zhang. He has been working in Wide Bandgap Semiconductor Materials and Devices Laboratory for Beijing University of Chemical Technology since 2018. His current research focuses on the growth and preparation of aluminum nitride and boron nitride

        Xu Li got his B.S. degree from Northeastern University in 2018. Now he is a postgraduate student at Beijing University of Chemical Technology under the supervision of Prof. Jicai Zhang. He has been working in Wide Bandgap Semiconductor Materials and Devices Laboratory for Beijing University of Chemical Technology since 2018. His current research focuses on the growth of aluminum nitride and boron nitride

        Ting Liu received her Ph.D. degree from University of Chinese Academy of Sciences in 2018. She was a postdoctor researcher in Nagoya University and National Institute for Materials Science in Japan from 2018 to 2020. In 2021, she joined the School of Mathematics and Physics in Beijing University of Chemical Technology as an Associate Professor. Her current research interests include Non-polar AlN, BN, AlGaN-based deep ultraviolet LED and wearable technology research

        Yong Lu received the Ph.D. degree in Beijing Institute of Applied Physics and Computational Mathematics in 2014. He worked as a postdoctoral researcher in Beijing Computing Science Research Center from 2014 to 2016. He joined the college of mathematics and physics, Beijing University of Chemical Technology in 2016 and presently is the associate professor. His research interests mainly focus on the lattice dynamics, thermal transport properties, dynamic simulation of crystal growth, defects and doping in semiconductors

        Jicai Zhang received the B.S. degree in physics from Qufu Normal University in1997, the M.S. degree in condensed matter physics from Peking University in 2001, and the Ph.D. degree in microelectronics and solid-state electronics from the Institute of Semiconductors, CAS, in 2005. From 2005 to 2017, he was with Technion-Israel Institute of Technology, Israel, Nagoya Institute of Technology and Mie University, Japan, Suzhou Institute of Nano-Tech and Nano- Bionics, CAS, China, respectively. Since 2017, he has been with Beijing University of Chemical Technology as a Professor. His current research focused on group-III nitrides and related devices

      • Corresponding author: luy@mail.buct.edu.cnjczhang@mail.buct.edu.cn
      • Received Date: 2021-03-20
      • Revised Date: 2021-03-27
      • Published Date: 2021-08-10

      Catalog

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return