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Impact of switching frequencies on the TID response of SiC power MOSFETs

Sheng Yang1, 2, 3, Xiaowen Liang1, 2, 3, Jiangwei Cui1, 2, Qiwen Zheng1, 2, Jing Sun1, 2, Mohan Liu1, 2, Dang Zhang1, 2, Haonan Feng1, 2, 3, Xuefeng Yu1, 2, , Chuanfeng Xiang1, 2, Yudong Li1, 2 and Qi Guo1, 2

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 Corresponding author: Xuefeng Yu, yuxf@ms.xjb.ac.cn

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Abstract: Different switching frequencies are required when SiC metal–oxide–semiconductor field-effect transistors (MOSFETs) are switching in a space environment. In this study, the total ionizing dose (TID) responses of SiC power MOSFETs are investigated under different switching frequencies from 1 kHz to 10 MHz. A significant shift was observed in the threshold voltage as the frequency increased, which resulted in premature failure of the drain–source breakdown voltage and drain–source leakage current. The degradation is attributed to the high activation and low recovery rates of traps at high frequencies. The results of this study suggest that a targeted TID irradiation test evaluation method can be developed according to the actual switching frequency of SiC power MOSFETs.

Key words: SiC power MOSFETswitching frequencyoxide traptotal ionizing dosetransistorsemiconductor theory



[1]
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Yuan X B, Laird I, Walder S. Opportunities, challenges, and potential solutions in the application of fast-switching SiC power devices and converters. IEEE Trans Power Electron, 2021, 36, 3925 doi: 10.1109/TPEL.2020.3024862
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Kobayashi Y, Yokozeki T, Matsuda T, et al. Gamma-ray irradiation response of the motor-driver circuit with SiC MOSFETs. Mater Sci Forum, 2016, 858, 868 doi: 10.4028/www.scientific.net/MSF.858.868
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Fig. 1.  Potential application examples using SiC devices at various voltage and frequency levels[15].

Fig. 2.  (Color online) SiC power MOSFET. (a) Variation in threshold voltage with the total ionizing dose at ON, OFF, and different frequencies. (b) Relation between the change in threshold voltage and applied switching frequency under the same total ionizing dose.

Fig. 3.  (Color online) SiC power MOSFETs at ON, OFF, and different frequencies. (a) Variation in drain–source leakage current with the total ionizing dose. (b) Change in breakdown voltage with the total ionizing dose.

Fig. 4.  A model hole trapping [(a) to (b)] and detrapping [(c) to (a)] processes are indicated, along with the intermediate compensation/reverse-annealing phenomenon [(b) to (c) and (c) to (b)][18].

Fig. 5.  (Color online) Comparison of threshold voltage of SiC Power MOSFETs with the total ionizing dose under 15 and 0 V segment gate bias, constant 0 V gate bias, and constant 15 V gate bias.

[1]
She X, Huang A Q, Lucía Ó, et al. Review of silicon carbide power devices and their applications. IEEE Trans Ind Electron, 2017, 64, 8193 doi: 10.1109/TIE.2017.2652401
[2]
Akturk A, McGarrity J M, Potbhare S, et al. Radiation effects in commercial 1200 V 24 A silicon carbide power MOSFETs. IEEE Trans Nucl Sci, 2012, 59, 3258 doi: 10.1109/TNS.2012.2223763
[3]
Chen W, Yang H L, Guo X Q, et al. The research status and challenge of space radiation physics and application. Chin Sci Bull, 2017, 62, 978 doi: 10.1360/N972016-00438
[4]
Zhang T, Allard B, Bi J. The synergetic effects of high temperature gate bias and total ionization dose on 1.2 kV SiC devices. Microelectron Reliab, 2018, 88–90, 631 doi: 10.1016/j.microrel.2018.06.046
[5]
Takeyama A, Matsuda T, Yokoseki T, et al. Improvement of radiation response of SiC MOSFETs under high temperature and humidity conditions. Jpn J Appl Phys, 2016, 55, 104101 doi: 10.7567/JJAP.55.104101
[6]
Zhang C X, Shen X, Zhang E, et al. Temperature dependence and postirradiation annealing response of the 1/f noise of 4H-SiC MOSFETs. IEEE Trans Electron Devices, 2013, 60, 2361 doi: 10.1109/TED.2013.2263426
[7]
Liang X W, Cui J W, Zheng Q W, et al. Study of the influence of gamma irradiation on long-term reliability of SiC MOSFET. Radiat Eff Defects Solids, 2020, 175, 559 doi: 10.1080/10420150.2019.1704757
[8]
Hu D Q, Zhang J W, Jia Y P, et al. Impact of different gate biases on irradiation and annealing responses of SiC MOSFETs. IEEE Trans Electron Devices, 2018, 65, 3719 doi: 10.1109/TED.2018.2858289
[9]
Takeyama A, Makino T, Okubo S, et al. Radiation response of negative gate biased SiC MOSFETs. Materials, 2019, 12, 2741 doi: 10.3390/ma12172741
[10]
Schwank J R, Shaneyfelt M R, Fleetwood D M, et al. Radiation effects in MOS oxides. IEEE Trans Nucl Sci, 2008, 55, 1833 doi: 10.1109/TNS.2008.2001040
[11]
Zhang C X, Zhang E, Fleetwood D M, et al. Effects of bias on the irradiation and annealing responses of 4H-SiC MOS devices. IEEE Trans Nucl Sci, 2011, 58, 2925 doi: 10.1109/TNS.2011.2168424
[12]
Todorovic M H, et al. SiC MW solar inverter. Proc Int Exhib Conf Power Electron Intell Motion Renewable Energy Manage Eur, 2016, 645
[13]
Fujii K, Noto Y, Oshima M, et al. 1-MW solar power inverter with boost converter using all SiC power module. 2015 17th European Conference on Power Electronics and Applications, 2015, 1
[14]
Yu D R, Qiao L, Jiang W J, et al. Development and prospect of electric propulsion technology in China. J Propul Technol, 2020, 41, 1
[15]
Yuan X B, Laird I, Walder S. Opportunities, challenges, and potential solutions in the application of fast-switching SiC power devices and converters. IEEE Trans Power Electron, 2021, 36, 3925 doi: 10.1109/TPEL.2020.3024862
[16]
Kobayashi Y, Yokozeki T, Matsuda T, et al. Gamma-ray irradiation response of the motor-driver circuit with SiC MOSFETs. Mater Sci Forum, 2016, 858, 868 doi: 10.4028/www.scientific.net/MSF.858.868
[17]
Oldham T R, McLean F B. Total ionizing dose effects in MOS oxides and devices. IEEE Trans Nucl Sci, 2003, 50, 483 doi: 10.1109/TNS.2003.812927
[18]
Lelis A J, Oldham T R, Boesch H E, et al. The nature of the trapped hole annealing process. IEEE Trans Nucl Sci, 1989, 36, 1808 doi: 10.1109/23.45373
[19]
Lelis A J, Green R, Habersat D B, et al. Basic mechanisms of threshold-voltage instability and implications for reliability testing of SiC MOSFETs. IEEE Trans Electron Devices, 2015, 62, 316 doi: 10.1109/TED.2014.2356172
[20]
Fiorenza P, Frazzetto A, Guarnera A, et al. Fowler-Nordheim tunneling at SiO2/4H-SiC interfaces in metal-oxide-semiconductor field effect transistors. Appl Phys Lett, 2014, 105, 142108 doi: 10.1063/1.4898009
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    Received: 08 February 2021 Revised: 19 April 2021 Online: Accepted Manuscript: 23 April 2021Uncorrected proof: 25 April 2021Published: 01 August 2021

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      Sheng Yang, Xiaowen Liang, Jiangwei Cui, Qiwen Zheng, Jing Sun, Mohan Liu, Dang Zhang, Haonan Feng, Xuefeng Yu, Chuanfeng Xiang, Yudong Li, Qi Guo. Impact of switching frequencies on the TID response of SiC power MOSFETs[J]. Journal of Semiconductors, 2021, 42(8): 082802. doi: 10.1088/1674-4926/42/8/082802 S Yang, X W Liang, J W Cui, Q W Zheng, J Sun, M H Liu, D Zhang, H N Feng, X F Yu, C F Xiang, Y D Li, Q Guo, Impact of switching frequencies on the TID response of SiC power MOSFETs[J]. J. Semicond., 2021, 42(8): 082802. doi: 10.1088/1674-4926/42/8/082802.Export: BibTex EndNote
      Citation:
      Sheng Yang, Xiaowen Liang, Jiangwei Cui, Qiwen Zheng, Jing Sun, Mohan Liu, Dang Zhang, Haonan Feng, Xuefeng Yu, Chuanfeng Xiang, Yudong Li, Qi Guo. Impact of switching frequencies on the TID response of SiC power MOSFETs[J]. Journal of Semiconductors, 2021, 42(8): 082802. doi: 10.1088/1674-4926/42/8/082802

      S Yang, X W Liang, J W Cui, Q W Zheng, J Sun, M H Liu, D Zhang, H N Feng, X F Yu, C F Xiang, Y D Li, Q Guo, Impact of switching frequencies on the TID response of SiC power MOSFETs[J]. J. Semicond., 2021, 42(8): 082802. doi: 10.1088/1674-4926/42/8/082802.
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      Impact of switching frequencies on the TID response of SiC power MOSFETs

      doi: 10.1088/1674-4926/42/8/082802
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      • Author Bio:

        Sheng Yang received the B.S. degree in Physics from Hubei University, Wuhan, China, in 2018. He is working toward the M.S. degree in Physical Electronics from Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Urumqi, China. His research interests include the radiation effect, simulation and reliability of silicon carbide power devices

        Xuefeng Yu received the B.S. degree in Applied Physics from Lanzhou University, Lanzhou, China in 1986. Since 2008, he has been a professor in the Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences. He received the approval notice of funding for the Leading Talents Research and Training Program of the 2019 Innovative Talents Training Program and went to Belgium for training and research. His research interests include damage mechanism and reliability of electronic devices in radiation environment

      • Corresponding author: yuxf@ms.xjb.ac.cn
      • Received Date: 2021-02-08
      • Revised Date: 2021-04-19
      • Published Date: 2021-08-10

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