A Sacrificial Layer Etching Method Applied in Surface Micromachining Using Agitated BHF and Glycerol Solution

  • National Key Laboratory of Micro/Nano Fabrication Technology,Institute of Microelectronics,Peking University,Beijing 100871,China
  • National Key Laboratory of Micro/Nano Fabrication Technology,Institute of Microelectronics,Peking University,Beijing 100871,China
  • National Key Laboratory of Micro/Nano Fabrication Technology,Institute of Microelectronics,Peking University,Beijing 100871,China

Key words: surface micromachiningsacrificial etchingBHFglycerol

Abstract: A modified buffered-HF solution with NH4F∶glycerol∶HF (4∶2∶1) is studied.With the implementation of a heating and agitating mechanism,this method is applied in a sacrificial layer etching scheme that increases the selectivity between silicon dioxide and aluminum.The etching rates of SiO2 and Al as a function of solution temperature are determined.Moreover,the effects of adding glycerol and agitating the etchant are examined and compared with this method.Finally,this method is tested on an actual device,and its efficiency is scrutinized.

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