Abstract: 利用傅里叶变换红外光谱仪和X射线激发的CKLL俄歇谱的一次微分表征了类金刚石(DLC)膜的微结构。指出在高离子能量轰击和低CH_4压强下所形成的DLC膜内以sp~3C-C键为主,并且sp~3碳成分随V/Pa~(1/2) 增加而增加,与退火温度从200℃ 到800℃无关,DLC膜具有好的热稳定性。DLC膜密度研究指出:膜密度与沉积参量和基底材料有关。
Article views: 1559 Times PDF downloads: 871 Times Cited by: 0 Times
Manuscript received: 20 August 2015 Manuscript revised: Online: Published: 01 January 1993
Journal of Semiconductors © 2017 All Rights Reserved 京ICP备05085259号-2