Chin. J. Semicond. > Volume 14 > Issue 1 > Article Number: 6

射频等离子体沉积类金刚石膜微结构的表征

杨伟毅

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Abstract: 利用傅里叶变换红外光谱仪和X射线激发的CKLL俄歇谱的一次微分表征了类金刚石(DLC)膜的微结构。指出在高离子能量轰击和低CH_4压强下所形成的DLC膜内以sp~3C-C键为主,并且sp~3碳成分随V/Pa~(1/2) 增加而增加,与退火温度从200℃ 到800℃无关,DLC膜具有好的热稳定性。DLC膜密度研究指出:膜密度与沉积参量和基底材料有关。

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History

Manuscript received: 20 August 2015 Manuscript revised: Online: Published: 01 January 1993

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