J. Semicond. > 2009, Volume 30 > Issue 11 > 113003

SEMICONDUCTOR MATERIALS

Characterization of quaternary AlInGaN epilayers and polarization-reduced InGaN/AlInGaN MQWgrown by MOCVD

Liu Naixin, Wang Junxi, Yan Jianchang, Liu Zhe, Ruan Jun and Li Jinmin

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DOI: 10.1088/1674-4926/30/11/113003

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Abstract: We have demonstrated the growth of quaternary AlInGaN compounds at different growth temperatures and pressures with metalorganic chemical vapor deposition (MOCVD). The optical properties of the samples have been investigated by photoluminescence (PL) at different temperatures. The results show that the sample grown at higher temperature (850 ℃) exhibits the best optical quality for its sharp band edge luminescence and weak yellow luminescence. The AlInGaN exhibited three-dimensional (3D) growth mode at higher pressure. The band edge emission almost disappeared. With the optimization of AlInGaN growth parameters, we replaced the traditional barrier in InGaN/GaN multiple quantum wells (MQWs) with AlInGaN barriers. The peak wavelength for the InGaN/AlInGaN-MQW based light emitting diodes (LEDs) was very stable at various injection current levels because of the polarization-matched InGaN/AlInGaN MQWs.

Key words: AlInGaN UV-LEDs MOCVD

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    Received: 18 August 2015 Revised: 19 June 2009 Online: Published: 01 November 2009

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      Liu Naixin, Wang Junxi, Yan Jianchang, Liu Zhe, Ruan Jun, Li Jinmin. Characterization of quaternary AlInGaN epilayers and polarization-reduced InGaN/AlInGaN MQWgrown by MOCVD[J]. Journal of Semiconductors, 2009, 30(11): 113003. doi: 10.1088/1674-4926/30/11/113003 ****Liu N X, Wang J X, Yan J C, Liu Z, Ruan J, Li J M. Characterization of quaternary AlInGaN epilayers and polarization-reduced InGaN/AlInGaN MQWgrown by MOCVD[J]. J. Semicond., 2009, 30(11): 113003. doi: 10.1088/1674-4926/30/11/113003.
      Citation:
      Liu Naixin, Wang Junxi, Yan Jianchang, Liu Zhe, Ruan Jun, Li Jinmin. Characterization of quaternary AlInGaN epilayers and polarization-reduced InGaN/AlInGaN MQWgrown by MOCVD[J]. Journal of Semiconductors, 2009, 30(11): 113003. doi: 10.1088/1674-4926/30/11/113003 ****
      Liu N X, Wang J X, Yan J C, Liu Z, Ruan J, Li J M. Characterization of quaternary AlInGaN epilayers and polarization-reduced InGaN/AlInGaN MQWgrown by MOCVD[J]. J. Semicond., 2009, 30(11): 113003. doi: 10.1088/1674-4926/30/11/113003.

      Characterization of quaternary AlInGaN epilayers and polarization-reduced InGaN/AlInGaN MQWgrown by MOCVD

      DOI: 10.1088/1674-4926/30/11/113003
      • Received Date: 2015-08-18
      • Accepted Date: 2009-03-23
      • Revised Date: 2009-06-19
      • Published Date: 2009-10-29

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