J. Semicond. > 2010, Volume 31 > Issue 3 > 034004

SEMICONDUCTOR DEVICES

Threshold voltage adjustment of organic thin film transistor by introducing a polysilicon floating gate

Wu Chenglong, Yang Jianhong, Cai Xueyuan and Shan Xiaofeng

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DOI: 10.1088/1674-4926/31/3/034004

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Abstract: The structure of organic thin film transistors (OTFTs) is optimized by introducing a floating gate into the gate dielectric to reduce the threshold voltage of OTFTs. Then the optimized device is simulated, and the simulation results show that the threshold voltage of optimized device is reduced by about 10 V. The reduction of the threshold voltage is helpful and useful for the application of OTFTs in many areas. In addition, this way of reducing the threshold voltage of OTFT is compatible with traditional silicon technology and can be used in manufacturing.

Key words: pentacene OTFT device optimization Pool–Frenkel mobility simulation

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    Received: 18 August 2015 Revised: 20 October 2009 Online: Published: 01 March 2010

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      Wu Chenglong, Yang Jianhong, Cai Xueyuan, Shan Xiaofeng. Threshold voltage adjustment of organic thin film transistor by introducing a polysilicon floating gate[J]. Journal of Semiconductors, 2010, 31(3): 034004. doi: 10.1088/1674-4926/31/3/034004 ****Wu C L, Yang J H, Cai X Y, Shan X F. Threshold voltage adjustment of organic thin film transistor by introducing a polysilicon floating gate[J]. J. Semicond., 2010, 31(3): 034004. doi: 10.1088/1674-4926/31/3/034004.
      Citation:
      Wu Chenglong, Yang Jianhong, Cai Xueyuan, Shan Xiaofeng. Threshold voltage adjustment of organic thin film transistor by introducing a polysilicon floating gate[J]. Journal of Semiconductors, 2010, 31(3): 034004. doi: 10.1088/1674-4926/31/3/034004 ****
      Wu C L, Yang J H, Cai X Y, Shan X F. Threshold voltage adjustment of organic thin film transistor by introducing a polysilicon floating gate[J]. J. Semicond., 2010, 31(3): 034004. doi: 10.1088/1674-4926/31/3/034004.

      Threshold voltage adjustment of organic thin film transistor by introducing a polysilicon floating gate

      DOI: 10.1088/1674-4926/31/3/034004
      • Received Date: 2015-08-18
      • Accepted Date: 2009-09-04
      • Revised Date: 2009-10-20
      • Published Date: 2010-02-08

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