Citation: |
Xie Yuanbin, Quan Si, Ma Xiaohua, Zhang Jincheng, Li Qingmin, Hao Yue. Monolithically integrated enhancement/depletion-mode AlGaN/GaN HEMT D flip-flop using fluorine plasma treatment[J]. Journal of Semiconductors, 2011, 32(6): 065001. doi: 10.1088/1674-4926/32/6/065001
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Xie Y B, Quan S, Ma X H, Zhang J C, Li Q M, Hao Y. Monolithically integrated enhancement/depletion-mode AlGaN/GaN HEMT D flip-flop using fluorine plasma treatment[J]. J. Semicond., 2011, 32(6): 065001. doi: 10.1088/1674-4926/32/6/065001.
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Monolithically integrated enhancement/depletion-mode AlGaN/GaN HEMT D flip-flop using fluorine plasma treatment
DOI: 10.1088/1674-4926/32/6/065001
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Abstract
Depletion-mode and enhancement-mode AlGaN/GaN HEMTs using fluorine plasma treatment were integrated on one wafer. Direct-coupled FET logic circuits, such as an E/D HEMT inverter, NAND gate and D flip-flop, were fabricated on an AlGaN/GaN heterostructure. The D flip-flop and NAND gate are demonstrated in a GaN system for the first time. The dual-gate AlGaN/GaN E-HEMT substitutes two single-gate E-HEMTs for simplifying the NAND gate and shrinking the area, integrating with a conventional AlGaN/GaN D-HEMT and demonstrating a NAND gate. E/D-mode D flip-flop was fabricated by integrating the inverters and the NAND gate on the AlGaN/GaN heterostructure. At a supply voltage of 2 V, the E/D inverter shows an output logic swing of 1.7 V, a logic-low noise margin of 0.49 V and a logic-high noise margin of 0.83 V. The NAND gate and D flip-flop showed correct logic function demonstrating promising potential for GaN-based digital ICs.-
Keywords:
- AlGaN/GaN
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References
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