Citation: |
Xi Liu, Qian Liu, Xiaoshi Jin, Yongrui Zhao, Jong-Ho Lee. Negative voltage bandgap reference with multilevel curvature compensation technique[J]. Journal of Semiconductors, 2016, 37(5): 055008. doi: 10.1088/1674-4926/37/5/055008
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X Liu, Q Liu, X S Jin, Y R Zhao,J H Lee. Negative voltage bandgap reference with multilevel curvature compensation technique[J]. J. Semicond., 2016, 37(5): 055008. doi: 10.1088/1674-4926/37/5/055008.
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Negative voltage bandgap reference with multilevel curvature compensation technique
DOI: 10.1088/1674-4926/37/5/055008
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Abstract
A novel high-order curvature compensation negative voltage bandgap reference (NBGR) based on a novel multilevel compensation technique is introduced. Employing an exponential curvature compensation (ECC) term with many high order terms in itself, in a lower temperature range (TR) and a multilevel curvature compensation (MLCC) term in a higher TR, a flattened and better effect of curvature compensation over the TR of 165 ℃ (-40 to 125 ℃ ) is realised. The MLCC circuit adds two convex curves by using two sub-threshold operated NMOS. The proposed NBGR implemented in the Central Semiconductor Manufacturing Corporation (CSMC) 0.5 μm BCD technology demonstrates an accurate voltage of -1.183 V with a temperature coefficient (TC) as low as 2.45 ppm/℃ over the TR of 165 ℃ at a -5.0 V power supply; the line regulation is 3 mV/V from a -5 to -2 V supply voltage. The active area of the presented NBGR is 370 × 180 μm2. -
References
[1] [2] [3] [4] [5] [6] [7] [8] [9] [10] [11] -
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