Chin. J. Semicond. > 1999, Volume 20 > Issue 4 > 319-323
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Study on Interfacial SiO_2 Layer of Silicon Direct Bonding

He Jin , Wang Xin and Chen Xingbi

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    Received: 20 August 2015 Revised: Online: Published: 01 April 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(4): 319-323
      He Jin, Wang Xin, Chen Xingbi. Study on Interfacial SiO_2 Layer of Silicon Direct Bonding[J]. 半导体学报(英文版), 1999, 20(4): 319-323.
      Citation:
      He Jin, Wang Xin, Chen Xingbi. Study on Interfacial SiO_2 Layer of Silicon Direct Bonding[J]. 半导体学报(英文版), 1999, 20(4): 319-323.
      shu

      • Received Date: 2015-08-20

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