Chin. J. Semicond. > 1994, Volume 15 > Issue 7 > 505-510

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GaAs表面钝化的新方法：S2Cl2处理

李喆深，蔡卫中，苏润洲，侯晓远，董国胜，金晓峰，丁训民，王迅

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    Received: 18 August 2015 Revised: Online: Published: 01 July 1994

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      Article Navigation >  Journal of Semiconductors  > 1994  >  15(7): 505-510
      李喆深，蔡卫中，苏润洲，侯晓远，董国胜，金晓峰，丁训民，王迅. GaAs表面钝化的新方法：S2Cl2处理[J]. 半导体学报(英文版), 1994, 15(7): 505-510.
      Citation:
      李喆深，蔡卫中，苏润洲，侯晓远，董国胜，金晓峰，丁训民，王迅. GaAs表面钝化的新方法：S2Cl2处理[J]. 半导体学报(英文版), 1994, 15(7): 505-510.
      shu

      • Received Date: 2015-08-18

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