| Citation: |
Zhu Zhen, Huang Qing’an, Li Weihua, Zhou Zaifa, Feng Ming. Simulation of the Diffraction Effect in Exposure on a SU-8 Photoresist and the Glycerol Compensated Method[J]. Journal of Semiconductors, 2007, 28(12): 2011-2017.
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Zhu Z, Huang Q, Li W H, Zhou Z F, Feng M. Simulation of the Diffraction Effect in Exposure on a SU-8 Photoresist and the Glycerol Compensated Method[J]. Chin. J. Semicond., 2007, 28(12): 2011.
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Simulation of the Diffraction Effect in Exposure on a SU-8 Photoresist and the Glycerol Compensated Method
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Abstract
According to a Fresnel diffraction model,and considering the reflection and refraction at the glycerol/SU-8 interface,this paper simulates the aerial image when glycerol is applied between the photomask and resist.Compared to the experimental results,the model can describe the lithography process competently and be applied in design.-
Keywords:
- SU-8 photoresist,
- Fresnel diffraction,
- glycerol
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References
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Proportional views
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