Chin. J. Semicond. > 1993, Volume 14 > Issue 12 > 771-773
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用离子注入控制形成多孔硅发光图形

杨海强 , 鲍希茂 , 杨志锋 and 洪建明

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    Received: 20 August 2015 Revised: Online: Published: 01 December 1993

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      Article Navigation >  Journal of Semiconductors  > 1993  >  14(12): 771-773
      杨海强, 鲍希茂, 杨志锋, 洪建明. 用离子注入控制形成多孔硅发光图形[J]. 半导体学报(英文版), 1993, 14(12): 771-773.
      Citation:
      杨海强, 鲍希茂, 杨志锋, 洪建明. 用离子注入控制形成多孔硅发光图形[J]. 半导体学报(英文版), 1993, 14(12): 771-773.
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      • Received Date: 2015-08-20

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