Chin. J. Semicond. > 1980, Volume 1 > Issue 2 > 162-162
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一种新颖的无显影光刻技术

裴荣祥 , 洪啸吟 , 韩阶平 and 金维新

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Abstract:

光刻技术是制造半导体器件的重要工艺之一,自六十年代初,在半导体工业得到运用以来,大大促进了半导体器件和集成电路的发展,至今仍占有重要地位.随着半导体器件向更高频率和大规模集成的方向发展,要求器件的尺寸越来越小,

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1980

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      Article Navigation >  Journal of Semiconductors  > 1980  >  1(2): 162-162
      裴荣祥, 洪啸吟, 韩阶平, 金维新. 一种新颖的无显影光刻技术[J]. 半导体学报(英文版), 1980, 1(2): 162-162.
      Citation:
      裴荣祥, 洪啸吟, 韩阶平, 金维新. 一种新颖的无显影光刻技术[J]. 半导体学报(英文版), 1980, 1(2): 162-162.
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      • Received Date: 2015-08-20

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