Chin. J. Semicond. > 2002, Volume 23 > Issue 6 > 561-564

CONTENTS

退火过程中自组织生长

胡冬枝 , 杨建树 , 蔡群 , 张翔九 , 胡际璜 and 蒋最敏

+ Author Affiliations

PDF

Key words: 量子点, 硅基材料, 形貌评价, AFM

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2499 Times PDF downloads: 784 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 June 2002

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 2002  >  23(6): 561-564
      胡冬枝, 杨建树, 蔡群, 张翔九, 胡际璜, 蒋最敏. 退火过程中自组织生长[J]. 半导体学报(英文版), 2002, 23(6): 561-564.
      Citation:
      胡冬枝, 杨建树, 蔡群, 张翔九, 胡际璜, 蒋最敏. 退火过程中自组织生长[J]. 半导体学报(英文版), 2002, 23(6): 561-564.
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return