Chin. J. Semicond. > 1996, Volume 17 > Issue 2 > 145-150
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快速热氮化SiO_xN_y薄介质膜的电荷特性与光学性质

陈蒲生，岑洁儒，董长江

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    Received: 18 August 2015 Revised: Online: Published: 01 February 1996

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      Article Navigation >  Journal of Semiconductors  > 1996  >  17(2): 145-150
      陈蒲生，岑洁儒，董长江. 快速热氮化SiO_xN_y薄介质膜的电荷特性与光学性质[J]. 半导体学报(英文版), 1996, 17(2): 145-150.
      Citation:
      陈蒲生，岑洁儒，董长江. 快速热氮化SiO_xN_y薄介质膜的电荷特性与光学性质[J]. 半导体学报(英文版), 1996, 17(2): 145-150.
      shu

      • Received Date: 2015-08-18

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