Chin. J. Semicond. > 1981, Volume 2 > Issue 2 > 161-163
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用电导法测定Si-SiO_2低界面态密度和俘获截面

史常忻 , 陆德仁 and 顾为芳

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1981

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      Article Navigation >  Journal of Semiconductors  > 1981  >  2(2): 161-163
      史常忻, 陆德仁, 顾为芳. 用电导法测定Si-SiO_2低界面态密度和俘获截面[J]. 半导体学报(英文版), 1981, 2(2): 161-163.
      Citation:
      史常忻, 陆德仁, 顾为芳. 用电导法测定Si-SiO_2低界面态密度和俘获截面[J]. 半导体学报(英文版), 1981, 2(2): 161-163.
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      • Received Date: 2015-08-20

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