Chin. J. Semicond. > 1982, Volume 3 > Issue 2 > 155-158
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砷化镓掺硫气相外延

吴赛娟 , 仇兰华 , 陆大成 , 于清 and 王瑞林

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1982

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      Article Navigation >  Journal of Semiconductors  > 1982  >  3(2): 155-158
      吴赛娟, 仇兰华, 陆大成, 于清, 王瑞林. 砷化镓掺硫气相外延[J]. 半导体学报(英文版), 1982, 3(2): 155-158.
      Citation:
      吴赛娟, 仇兰华, 陆大成, 于清, 王瑞林. 砷化镓掺硫气相外延[J]. 半导体学报(英文版), 1982, 3(2): 155-158.
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      • Received Date: 2015-08-20

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