Chin. J. Semicond. > 2003, Volume 24 > Issue 5 > 556-560

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内嵌设备模型的离子注入工艺模拟程序

李煜 , 李瑞伟 and 王纪民

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Key words: 设备模型, 工艺模拟, 离子注入, 沟道效应

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    Received: 20 August 2015 Revised: Online: Published: 01 May 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(5): 556-560
      李煜, 李瑞伟, 王纪民. 内嵌设备模型的离子注入工艺模拟程序[J]. 半导体学报(英文版), 2003, 24(5): 556-560.
      Citation:
      李煜, 李瑞伟, 王纪民. 内嵌设备模型的离子注入工艺模拟程序[J]. 半导体学报(英文版), 2003, 24(5): 556-560.
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      • Received Date: 2015-08-20

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