Chin. J. Semicond. > 2003, Volume 24 > Issue 5 > 499-503
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等离子体-热丝CVD技术制备多晶硅薄膜

刘丰珍 , 朱美芳 , 冯勇 , 刘金龙 , 汪六九 and 韩一琴

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Key words: 等离子体-热丝CVD, 多晶硅, 薄膜结构, 光学性质

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    Received: 20 August 2015 Revised: Online: Published: 01 May 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(5): 499-503
      刘丰珍, 朱美芳, 冯勇, 刘金龙, 汪六九, 韩一琴. 等离子体-热丝CVD技术制备多晶硅薄膜[J]. 半导体学报(英文版), 2003, 24(5): 499-503.
      Citation:
      刘丰珍, 朱美芳, 冯勇, 刘金龙, 汪六九, 韩一琴. 等离子体-热丝CVD技术制备多晶硅薄膜[J]. 半导体学报(英文版), 2003, 24(5): 499-503.
      shu

      • Received Date: 2015-08-20

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