Chin. J. Semicond. > 1993, Volume 14 > Issue 6 > 375-380
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CF_4、SF_6和NF_3反应离子腐蚀硅表面粗糙度的研究

苏毅 , 谭淞生 and 王渭源

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    Received: 20 August 2015 Revised: Online: Published: 01 June 1993

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      Article Navigation >  Journal of Semiconductors  > 1993  >  14(6): 375-380
      苏毅, 谭淞生, 王渭源. CF_4、SF_6和NF_3反应离子腐蚀硅表面粗糙度的研究[J]. 半导体学报(英文版), 1993, 14(6): 375-380.
      Citation:
      苏毅, 谭淞生, 王渭源. CF_4、SF_6和NF_3反应离子腐蚀硅表面粗糙度的研究[J]. 半导体学报(英文版), 1993, 14(6): 375-380.
      shu

      • Received Date: 2015-08-20

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