Chin. J. Semicond. > 1993, Volume 14 > Issue 3 > 160-165
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淀积参数对ITO膜电阻率的影响

张怀武 , 许武毅 and 过壁君

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1993

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      Article Navigation >  Journal of Semiconductors  > 1993  >  14(3): 160-165
      张怀武, 许武毅, 过壁君. 淀积参数对ITO膜电阻率的影响[J]. 半导体学报(英文版), 1993, 14(3): 160-165.
      Citation:
      张怀武, 许武毅, 过壁君. 淀积参数对ITO膜电阻率的影响[J]. 半导体学报(英文版), 1993, 14(3): 160-165.
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      • Received Date: 2015-08-20

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