Chin. J. Semicond. > 2002, Volume 23 > Issue 8 > 825-829
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衬底温度对直接光CVD SiO_2薄膜特性的影响

刘玉荣 , 杜开瑛 and 李观启

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Key words: 直接光CVD, SiO2薄膜, C-V特性

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    Received: 19 August 2015 Revised: Online: Published: 01 August 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(8): 825-829
      刘玉荣, 杜开瑛, 李观启. 衬底温度对直接光CVD SiO_2薄膜特性的影响[J]. 半导体学报(英文版), 2002, 23(8): 825-829.
      Citation:
      刘玉荣, 杜开瑛, 李观启. 衬底温度对直接光CVD SiO_2薄膜特性的影响[J]. 半导体学报(英文版), 2002, 23(8): 825-829.
      shu

      • Received Date: 2015-08-19

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