Chin. J. Semicond. > 2000, Volume 21 > Issue 9 > 849-852
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Improvement in Electrical Properties of SIMNI Films by Multiple-Step Implantation

卢殿通 and Heiner Ryssel

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    Received: 20 August 2015 Revised: Online: Published: 01 September 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(9): 849-852
      卢殿通, Heiner Ryssel. Improvement in Electrical Properties of SIMNI Films by Multiple-Step Implantation[J]. 半导体学报(英文版), 2000, 21(9): 849-852.
      Citation:
      卢殿通, Heiner Ryssel. Improvement in Electrical Properties of SIMNI Films by Multiple-Step Implantation[J]. 半导体学报(英文版), 2000, 21(9): 849-852.
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      • Received Date: 2015-08-20

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