Citation: |
邹建平, 吴俊辉, 朱青, 濮林, 朱健民, 鲍希茂. 硅基底电子束蒸发铝膜阳极氧化特性[J]. 半导体学报(英文版), 2000, 21(3): 255-259.
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Key words: 多孔氧化铝, 阳极氧化, 电子束蒸发
Article views: 2879 Times PDF downloads: 1317 Times Cited by: 0 Times
Received: 20 August 2015 Revised: Online: Published: 01 March 2000
Citation: |
邹建平, 吴俊辉, 朱青, 濮林, 朱健民, 鲍希茂. 硅基底电子束蒸发铝膜阳极氧化特性[J]. 半导体学报(英文版), 2000, 21(3): 255-259.
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