Chin. J. Semicond. > 1982, Volume 3 > Issue 6 > 450-457
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热处理硅中的氧、碳沉淀

许振嘉 , 蒋四南 , 孙伯康 and 刘江夏

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    Received: 20 August 2015 Revised: Online: Published: 01 June 1982

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      Article Navigation >  Journal of Semiconductors  > 1982  >  3(6): 450-457
      许振嘉, 蒋四南, 孙伯康, 刘江夏. 热处理硅中的氧、碳沉淀[J]. 半导体学报(英文版), 1982, 3(6): 450-457.
      Citation:
      许振嘉, 蒋四南, 孙伯康, 刘江夏. 热处理硅中的氧、碳沉淀[J]. 半导体学报(英文版), 1982, 3(6): 450-457.
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      • Received Date: 2015-08-20

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