Citation: |
Xiaoliang Wang(王晓亮), Dianzhao Sun(孙殿照), Jianping Zhang(张剑平), Meiying Kong(孔梅影), Yiping Zeng(曾一平), Jinmin Li(李晋闽), Lanying Lin(林兰英). AlxGa1-xN and GaN/AlxGa1-xN Quantum Wells Grown by Gas Source Molecular Beam Epitaxy[J]. 半导体学报(英文版), 1999, 20(5): 407-411.
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Abstract
A lxGa1- xN and GaN/A lxGa1- xN quantum wells were successfully grown on basal plane sapphire substrates by gas source molecular beam epitaxy using ammonia as nitrogen source. Photoluminescence measurements were carried out for the samples grown. The results show that the blue shifts in optical transition energy due to quantum size effect are 57meV at room temperature and 49meV at 80K for the GaN/Al0.12Ga0.88N quantum well sample having 6 GaN wells each with width of 7nm.
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