Chin. J. Semicond. > 2000, Volume 21 > Issue 9 > 914-917
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氮化铝薄膜的低温沉积

孙剑 , 吴嘉达 , 应质峰 , 施维 , 凌浩 , 周筑颖 , 丁训民 , 王康林 and 李富铭

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Key words: 氮化铝, 低温沉积, 薄膜

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    Received: 20 August 2015 Revised: Online: Published: 01 September 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(9): 914-917
      孙剑, 吴嘉达, 应质峰, 施维, 凌浩, 周筑颖, 丁训民, 王康林, 李富铭. 氮化铝薄膜的低温沉积[J]. 半导体学报(英文版), 2000, 21(9): 914-917.
      Citation:
      孙剑, 吴嘉达, 应质峰, 施维, 凌浩, 周筑颖, 丁训民, 王康林, 李富铭. 氮化铝薄膜的低温沉积[J]. 半导体学报(英文版), 2000, 21(9): 914-917.
      shu

      • Received Date: 2015-08-20

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