Chin. J. Semicond. > 2005, Volume 26 > Issue 7 > 1480-1484

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成像干涉光刻技术与离轴照明光刻技术的对比分析

刘娟 , 张锦 and 冯伯儒

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Key words: 倾斜照明, 成像干涉光刻技术, 离轴照明技术, 光刻技术

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    Received: 18 August 2015 Revised: Online: Published: 01 July 2005

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      Article Navigation >  Journal of Semiconductors  > 2005  >  26(7): 1480-1484
      刘娟, 张锦, 冯伯儒. 成像干涉光刻技术与离轴照明光刻技术的对比分析[J]. 半导体学报(英文版), 2005, 26(7): 1480-1484.
      Citation:
      刘娟, 张锦, 冯伯儒. 成像干涉光刻技术与离轴照明光刻技术的对比分析[J]. 半导体学报(英文版), 2005, 26(7): 1480-1484.
      shu

      • Received Date: 2015-08-18

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