Chin. J. Semicond. > 1982, Volume 3 > Issue 2 > 136-140
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硅中注入高剂量氮离子的研究

孙慧玲 , 陈鸣 and 王培大

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1982

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      Article Navigation >  Journal of Semiconductors  > 1982  >  3(2): 136-140
      孙慧玲, 陈鸣, 王培大. 硅中注入高剂量氮离子的研究[J]. 半导体学报(英文版), 1982, 3(2): 136-140.
      Citation:
      孙慧玲, 陈鸣, 王培大. 硅中注入高剂量氮离子的研究[J]. 半导体学报(英文版), 1982, 3(2): 136-140.
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      • Received Date: 2015-08-20

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