Chin. J. Semicond. > 1993, Volume 14 > Issue 3 > 174-180
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含氮CZ硅力学行为研究

石志仪 , 谢书银 , 佘思明 , 李立本 and 张锦心

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1993

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      Article Navigation >  Journal of Semiconductors  > 1993  >  14(3): 174-180
      石志仪, 谢书银, 佘思明, 李立本, 张锦心. 含氮CZ硅力学行为研究[J]. 半导体学报(英文版), 1993, 14(3): 174-180.
      Citation:
      石志仪, 谢书银, 佘思明, 李立本, 张锦心. 含氮CZ硅力学行为研究[J]. 半导体学报(英文版), 1993, 14(3): 174-180.
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      • Received Date: 2015-08-20

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