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Abstract: A semi-experienced low-field hole mobility model of a strained Si1-xGex/Si pMOSFET is proposed by considering the effect of the strain on the energy-band structure of SiGe alloy.This model includes the variation of mobility with strain (Ge content) and the coulomb-scattering mechanism of interface-trapped charges on inversion carriers.Using the model,the change of the hole mobility with strain (Ge content) is simulated at room temperature,and the influence of some factors on mobility is discussed.
Key words: p-MOSFET, strained Si1-xGex, hole mobility
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Received: 18 August 2015 Revised: Online: Published: 01 November 2006
Citation: |
Zhang Xuefeng, Xu Jingping, Zou Xiao, Zhang Lanjun. A Low-Field Hole Mobility Model of Strained Si1-xGex pMOSFET[J]. Journal of Semiconductors, 2006, 27(11): 2000-2004.
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Zhang X F, Xu J P, Zou X, Zhang L J. A Low-Field Hole Mobility Model of Strained Si1-xGex pMOSFET[J]. Chin. J. Semicond., 2006, 27(11): 2000.
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