Citation: |
Dai Yuehua, Chen Junning, Ke Daoming. Regular Perturbation Method for Studying the Subthreshold Characteristics of Nano-Scaled MOSFETs[J]. Journal of Semiconductors, 2007, 28(2): 237-240.
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Dai Y H, Chen J N, Ke D M. Regular Perturbation Method for Studying the Subthreshold Characteristics of Nano-Scaled MOSFETs[J]. Chin. J. Semicond., 2007, 28(2): 237.
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Regular Perturbation Method for Studying the Subthreshold Characteristics of Nano-Scaled MOSFETs
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Abstract
We present a new method for studying the subthreshold characteristics of nano-scaled MOSFETs,which we call the "regular perturbation method" . The Poisson equation is solved using this method for the first time.In particular,the depletion approximation and charge-sheet model in the Poisson equation are avoided due to their invalidity in nano-scaled MOSFETs.This yields a conventional exponential form of the subthreshold current,and the subthreshold swing can be obtained analytically from this current equation.The results of the model are compared and verified with the numerical simulation. -
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