Chin. J. Semicond. > 2005, Volume 26 > Issue 1 > 29-33

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Abstract: Thin-film accumulation-mode SOI pMOSFETs are fabricated and investigated.Their characteristics are compared with those of thin-film inversion-mode pMOSFETs.The subthreshold slope is 69mV/decade,and it almost has no DIBL effect.The breakdown voltage is 10.5V,which is increased by 40% relative to thin-film inversion-mode pMOSFET.The saturation current is 130μA/μm,which is enhanced by 27% compared with inversion-mode pMOSFET.The per-stage propagation delay of 101-stage SOI CMOS ring oscillator is 56ps with 3V supply voltage.

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    Received: 19 August 2015 Revised: Online: Published: 01 January 2005

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      Lian Jun, Hai Chaohe,and Cheng Chao. Thin-Film Accumulation-Mode SOI pMOSFET[J]. Journal of Semiconductors, 2005, 26(1): 29-33. ****Lian Jun, Hai Chaohe,and Cheng Chao, Thin-Film Accumulation-Mode SOI pMOSFET[J]. Journal of Semiconductors, 2005, 26(1), 29-33
      Citation:
      Lian Jun, Hai Chaohe,and Cheng Chao. Thin-Film Accumulation-Mode SOI pMOSFET[J]. Journal of Semiconductors, 2005, 26(1): 29-33. ****
      Lian Jun, Hai Chaohe,and Cheng Chao, Thin-Film Accumulation-Mode SOI pMOSFET[J]. Journal of Semiconductors, 2005, 26(1), 29-33

      Thin-Film Accumulation-Mode SOI pMOSFET

      • Received Date: 2015-08-19

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